发明名称 SEMICONDUCTOR MEMORY CELL AND METHOD OF PRODUCING SAME
摘要 A semiconductor storage element is disclosed having a storage capacitor whose storage electrode is arranged above a doped semiconductor layer. The storage electrode is formed of a portion of a strip-like reference potential line which is separated from the semiconductor layer by a thin insulating layer. A transfer gate is also provided adjacent to the storage electrode which is formed from a portion of a strip-like word line likewise separated from the semiconductor layer by a thinner insulating layer. An oppositely doped zone is arranged at a surface of the semiconductor layer and serves as a bit line. The word line and the reference potential line run parallel to one another and are arranged directly adjacent to one another. When a potential is connected to the transfer gate, the bit line doped zone may be selectively conductively connected to the storage zone. The reference potential line for one group of the storage elements can be also used as a word line for another group of the storage elements.
申请公布号 JPS5458385(A) 申请公布日期 1979.05.11
申请号 JP19780119867 申请日期 1978.09.28
申请人 SIEMENS AG 发明人 KURUTO HOFUMAN;RAINAA JIGUTSUSHIYU
分类号 H01L27/10;G11C11/35;G11C11/403;G11C11/41;H01L21/8242;H01L27/108 主分类号 H01L27/10
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