| 摘要 |
PURPOSE:To provide a vapor deposition apparatus which is capable of forming uniform deposited membrane, by smooth transmission of revolution between a wafer chucking jig and chuck setting jig by use of a gear mechanism. CONSTITUTION:A main shaft 3 is made to pass through a supporting rod 2 installed at the upper part of a treating space in a bell jar, and at the lower end of the main shaft 3 is attached a supporting plate 7 which extends horizontally in three directions. At the three extended ends of the plate 7 are fitted rotatable shafts 8. A spring belt is applied to a pulley 10 fixed at the upper end of the shaft 8 and to outer periphery of a supporting pipe 6, so that the pulley 10 is rotated by the rotation of the main shaft 3. The lower part of the shaft 8 pierces the center of a master pulley 13, and at the projected end of the pulley 13 is fixed a chuck setting jig 15. At the peripheral part of the jig 15 are attached six rotatable shafts 16, to which are fixed disc wafer-chucking jigs 20 at the lower ends. The transmission of revolution between the jigs 15 and 20 is conducted with a master gear 26 and an auxiliary gear 27 which are coupled directly. In Figure, 24, 22 show material to be evaporated and wafers respectively. |
