发明名称 Passivated semiconductor devices - esp. mesa diodes, where edges of pn junctions are covered by film of silica
摘要 <p>Device is made from a semiconductor substrate which has an active surface and another surface on the opposite side of the substrate, which contains >=1 pn-junction in a plane parallel with the active surface. The substrate (partly) coated with a thin passivating layer; and >=1 metal contact is applied to the active surface. Passivating layer and at least the surface of the metal have a feeble or zero mutual adhesion; and the active surface has horizontal, vertical, and sloping zones. Used esp. in the mfr. of mesa devices, where the pn junction extend to the periphery of the mesa.</p>
申请公布号 FR2406307(A1) 申请公布日期 1979.05.11
申请号 FR19770031146 申请日期 1977.10.17
申请人 RADIOTECHNIQUE COMPELEC 发明人 BERNARD ROGER
分类号 H01L21/56;H01L23/31;H01L29/06;(IPC1-7):01L29/06;01L21/316 主分类号 H01L21/56
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