发明名称 MASK ALIGNER
摘要 PURPOSE:To make dislodging of mask and wafer after exposure instantaneously by providing a backup plate for sucking and holding a mask in the central part of a mask holder and disposing a semiconductor wafer chuck of spherical form having suctio and blow-up functions in opposition thereto. CONSTITUTION:A flat and thick plate form backup plate 12 made of quartz transmitting ultraviolet rays is beforehand fitted in the central part of a mask holder 13 which sucks and holds a mask 11. The bottom surface of this plate 12 is used as a mask suctin surface 14, and lead holes 16 for vacuuming are looked out upon both end edges thereof. On the other hand, the suction surface 18 of a wafer chuck 19 for sucking and holding a semiconductor wafer is made spherical and is provided with lead holes 20 which provides both suction and blow-up over th entire surface of the suction surface 18. With such constitution, the wafer 17 is sucked by the suction surface 18 of the chuck 19 and is thereby forced down, and air is blow up through the lead hoels 20 to contact the wafer 17 and mask 11. When exposure is complated after this, the lead holes 20 are chaned over to vacuuming to lower the chuck 19, whereby these are separated.
申请公布号 JPS5447582(A) 申请公布日期 1979.04.14
申请号 JP19770113363 申请日期 1977.09.22
申请人 HITACHI LTD 发明人 YOSHIDA KIYOSHI;FUJISAWA ATSUSHI
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
代理机构 代理人
主权项
地址