发明名称 CLEANING FLUID FOR RESIDUAL FLUX
摘要 PURPOSE:To obtain the subject cleaning fluid having an improved solvency for hydrohalogenic acid salts of an amine which are the cause of corrosion of soldered junctions by blending a hydrohalogenic acid salt of an amine as an activator and a specified large ring polyether therein in a specified amount. CONSTITUTION:(A) A hydrohalogenic acid salt of an amine such as a diethylamine hydrochloride is used as an activator and (B) a large ring polyether represented by formula (C2H4O)n (n is 4, 5, 6 or 8) is added within a range of 0.1-2wt.% to provide the objective cleaning fluid.
申请公布号 JPH02103292(A) 申请公布日期 1990.04.16
申请号 JP19880254903 申请日期 1988.10.12
申请人 FUJITSU LTD 发明人 OCHIAI MASAYUKI;IKEDA NORIKO
分类号 C11D7/26;C11D7/50;H05K3/26 主分类号 C11D7/26
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