发明名称 |
Gas plasma reactor and process |
摘要 |
Process and apparatus for carrying out a reaction, such as etching aluminum, in the glow discharge of a gas plasma. The plasma is formed between a pair of closely spaced electrodes, and a distributed impedance is provided in series with the plasma to assure uniform distribution of the ionizing current and the glow discharge of the plasma throughout the region between the electrodes.
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申请公布号 |
US4148705(A) |
申请公布日期 |
1979.04.10 |
申请号 |
US19770774239 |
申请日期 |
1977.03.04 |
申请人 |
DIONEX CORPORATION |
发明人 |
BATTEY, JAMES F.;BERSIN, RICHARD L.;REICHELDERFER, RICHARD F.;WELTY, JOSEPH M. |
分类号 |
B01J12/00;C23C8/36;H01J37/32;(IPC1-7):C23C15/00;C23F1/00 |
主分类号 |
B01J12/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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