发明名称 Gas plasma reactor and process
摘要 Process and apparatus for carrying out a reaction, such as etching aluminum, in the glow discharge of a gas plasma. The plasma is formed between a pair of closely spaced electrodes, and a distributed impedance is provided in series with the plasma to assure uniform distribution of the ionizing current and the glow discharge of the plasma throughout the region between the electrodes.
申请公布号 US4148705(A) 申请公布日期 1979.04.10
申请号 US19770774239 申请日期 1977.03.04
申请人 DIONEX CORPORATION 发明人 BATTEY, JAMES F.;BERSIN, RICHARD L.;REICHELDERFER, RICHARD F.;WELTY, JOSEPH M.
分类号 B01J12/00;C23C8/36;H01J37/32;(IPC1-7):C23C15/00;C23F1/00 主分类号 B01J12/00
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