发明名称 Method of fabricating a two-phase charge coupled device
摘要 In a charge coupled device provided with a two-phase overlapping gate structure, charge flow directionality is built into the structure by forming an asymmetrical potential well beneath each gate electrode with a single offset mask. High packing density is achieved in an array of staggered bits and with each bit being designed to have a geometry of minimum size.
申请公布号 US4148132(A) 申请公布日期 1979.04.10
申请号 US19760656485 申请日期 1976.02.09
申请人 TRW INC. 发明人 BOWER, ROBERT W.
分类号 H01L21/033;H01L21/8234;H01L29/10;(IPC1-7):H01L21/26 主分类号 H01L21/033
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