发明名称 |
Method and apparatus for automatically inspecting and correcting masks |
摘要 |
A pair of chromium masks of similar pattern are optically read out to generate video signals corresponding to the patterns thereon. Comparison of the pair of masks is carried out in binary signals converted from the video signals using different recognition thresholds, thereby discriminating defects in the masks. Defect information is recorded in a recording medium and used for identifying and positioning the defects in the correction process.
|
申请公布号 |
US4148065(A) |
申请公布日期 |
1979.04.03 |
申请号 |
US19770762270 |
申请日期 |
1977.01.25 |
申请人 |
HITACHI, LTD. |
发明人 |
NAKAGAWA, KIYOSHI;TOORISAWA, SOICHI;IBE, HIROYUKI;NAKASHIMA, SHIGEAKI;HARA, YASUHIKO |
分类号 |
G01N21/88;G01N21/93;G01N21/956;G03F1/00;G03F1/08;H01L21/027 |
主分类号 |
G01N21/88 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|