发明名称 |
VERFAHREN ZUR HERSTELLUNG VON 1,1-DIFLUOR-1-CHLORAETHAN |
摘要 |
<p>In the continuous prodn. of 1,1-difluoro-1-chloroethane (I) from 1, 1-difluoroethane (II) and Cl2 in the liquid phase by the action of high energy light, a (II) content of is not 10 wt.% is maintained in the liquid phase by addn. of (II). The content of (I) in the liq. phase is maintained at 40-80 wt.%. Chlorination is carried out at 0.5-5 bar and -30 degrees C to +50 degrees C. The liq. phase contains 1 wt.% F2ClC-CHCl2 and F2ClC-CH2Cl. The liq. phase is discharged continuously from the photoreactor and distilled fractionally, the fraction, i.e. mixt. of (I) and (II), with a b.pt. -25 degrees C at normal pressure, being recycled to the photoreactor. The formation of by-prods. and esp. of HF is minimised.</p> |
申请公布号 |
DE2740585(A1) |
申请公布日期 |
1979.03.22 |
申请号 |
DE19772740585 |
申请日期 |
1977.09.09 |
申请人 |
HOECHST AG |
发明人 |
JOACHIM,DR. SEMMLER,HANS;FESER,MANFRED,DR. |
分类号 |
C07C17/10;(IPC1-7):C07C19/08 |
主分类号 |
C07C17/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|