发明名称 |
Electron beam exposure apparatus |
摘要 |
An electron beam exposure apparatus includes an electron beam emitting system having a means for varying the width of an electron beam. In this apparatus a plurality of identical pattern portions corresponding to a plurality of minimum width scanning lines are scanned one at a time, by an electron beam of a width corresponding to the number of repetitions of the minimum width scanning lines, according to the repetition information of the minimum width scanning lines of the electron beam.
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申请公布号 |
US4145615(A) |
申请公布日期 |
1979.03.20 |
申请号 |
US19770820707 |
申请日期 |
1977.08.01 |
申请人 |
TOKYO SHIBAURA ELECTRIC CO., LTD. |
发明人 |
SUMI, MASAHIKO |
分类号 |
H01L21/027;H01J37/30;(IPC1-7):A61K27/02;G21K1/08 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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