发明名称 MANUFACTURE FOR FIELD EFFECT TRANSISTOR
摘要 PURPOSE:To establish J-FET without deteriorating the performance of bipolar transistors, by forming the channel thickness and channel length with good precision, through the formation of the regions utilizing the same opening, by placing opening on the oxide film coated on the semiconductor substrate.
申请公布号 JPS5437689(A) 申请公布日期 1979.03.20
申请号 JP19770105196 申请日期 1977.08.31
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 FUJITA TSUTOMU
分类号 H01L29/80;H01L21/337;H01L21/8222;H01L21/8248;H01L27/06;H01L29/808 主分类号 H01L29/80
代理机构 代理人
主权项
地址