发明名称 SPUTTERING
摘要 PURPOSE:To reduce unnecesary gas molecular contained into the formed with reduced discharge gas pressure through vertical application of magnetic field to a magnetron type sputtering electrode having the electric and magnetic fields orthogonally arranged in the vacuum tank.
申请公布号 JPS5437076(A) 申请公布日期 1979.03.19
申请号 JP19770104611 申请日期 1977.08.30
申请人 NIPPON ELECTRIC CO 发明人 MATSUBARA TETSUHITO
分类号 C23C14/36;C23C14/35;H01J37/34 主分类号 C23C14/36
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