发明名称 PROCESS FOR PURIFYING WASTE GAS
摘要 <p>PURPOSE:To provide the subject process wherien even when the inlet temperature of waste gas, the quantity of the gas, and the concentration of offensive gas undergo changes, absorption, reaction, evaporation and drying of offensive age are carried out continuously while maintaining the outlet temperature constantly at a temperature more than the dew point in the same tower, thereby preventing occurrence of secondary public pollution such as public pollution due to waste gas and generation of waste water.</p>
申请公布号 JPS5433873(A) 申请公布日期 1979.03.12
申请号 JP19750113619 申请日期 1975.09.22
申请人 HITACHI LTD 发明人 ISAHAYA NORIO;YUKITAKE TSUGITA
分类号 B01D53/18;B01D53/14;B01D53/34;B01D53/50;B01D53/68;B01D53/81 主分类号 B01D53/18
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