| 发明名称 |
MANUFACTURE OF SEMICONDUCTOR DEVICE |
| 摘要 |
PURPOSE:To prevent the lateral etching and thus to secure formation of a pattern in a fixed measurement, by coating the side surface of the aperture part iwth the negative resist in the course of etching and then carrying out etching again. |
| 申请公布号 |
JPS5432068(A) |
申请公布日期 |
1979.03.09 |
| 申请号 |
JP19770097775 |
申请日期 |
1977.08.17 |
| 申请人 |
OKI ELECTRIC IND CO LTD |
发明人 |
NAKAMURA KAZUNORI;HASHIMOTO EIJI;NISHIMURO SUNAO |
| 分类号 |
H01L21/306;G03F7/20;H01L21/027;H01L21/302 |
主分类号 |
H01L21/306 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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