| 发明名称 |
PATTERN FORMATION METHOD |
| 摘要 |
PURPOSE:To produce a mask free from defect through step-and-repeat by using a reticule comprising the chip containing a desired pattern measurement and the chip the light shielding part enlarged on the same substrate. |
| 申请公布号 |
JPS5431282(A) |
申请公布日期 |
1979.03.08 |
| 申请号 |
JP19770097263 |
申请日期 |
1977.08.12 |
| 申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
KINOSHITA YASUO;ITASAKA TAKASHI |
| 分类号 |
H01L21/30;G03F1/84;G03F7/20;H01L21/027;H01L21/302 |
主分类号 |
H01L21/30 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
