| 摘要 |
The processing of image-wise exposed radiation sensitive devices such as radiation sensitive plates for lithographic printing plate production is effected by contacting the devices with developer liquid and optionally subjecting the devices to an overall exposure to actinic radiation prior to or during contact with the developer liquid. In order to compensate for the affects of temperature variation of the developer liquid, a temperature sensitive member (5) is immersed in the developer liquid. The member produces an output signal in dependence on the temperature of the developer liquid. This signal is used to control the degree to which the device is processed in a manner dependent on the temperature of the developer liquid for example by controlling the duration of contact of the device and the developer liquid, by controlling the degree to which the developer liquid is agitated in contact with the device, or by controlling the degree to which the device is subjected to the overall exposure to radiation.
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