| 发明名称 |
METHOD FOR DEVELOPING A PHOTOSENSITIVE RESIN PLATE |
| 摘要 |
<p>METHOD FOR DEVELOPING A PHOTOSENSITIVE RESIN PLATE A method for developing a photosensitive resin plate after exposure to make an image, which comprises applying suction to the surface of the photosensitive layer of the exposed plate so as to remove the resin composition at the non-exposed and non-hardended portion of the photosensitive layer.</p> |
| 申请公布号 |
CA1049313(A) |
申请公布日期 |
1979.02.27 |
| 申请号 |
CA19750223660 |
申请日期 |
1975.04.02 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
SANO, TAKEZO;UEMURA, YUKIKAZU;FURUTA, AKIHIRO |
| 分类号 |
G03F7/30;G03F7/36;(IPC1-7):03C5/24 |
主分类号 |
G03F7/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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