发明名称 HANDLING METHOD FOR SEMICONDUCTOR WAFER
摘要 <p>PURPOSE:To ensure an isolation process without any contamination of the wafer by carrying out the breaking and other processes for the semiconductor wafer in a state under which the main surface of the semiconductor wafer of the dicing, etc. is protected by a sheet.</p>
申请公布号 JPS5422759(A) 申请公布日期 1979.02.20
申请号 JP19770087392 申请日期 1977.07.22
申请人 HITACHI LTD 发明人 SHIMATA TSUTOMU;SUMIYA OSAMU
分类号 H01L21/301;H01L21/302 主分类号 H01L21/301
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