发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To obtain complementary J-FET of a highly integrated degree, which can feature a high-speed operation in low power by providing both the vertical and horizontal FET's onto the same semiconductor substrate.
申请公布号 JPS5422176(A) 申请公布日期 1979.02.19
申请号 JP19770087119 申请日期 1977.07.20
申请人 SEIKO INSTR & ELECTRONICS 发明人 IWAUCHI SHIGEKI
分类号 H01L29/80;H01L21/22;H01L21/337;H01L27/098;H01L29/808 主分类号 H01L29/80
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