发明名称 CORRECTION METHOD FOR PATTERN DEFICIENCY
摘要 <p>PURPOSE:To simply and surely correct deficiency, by adhering the material for correction on the transparent substrate, placing it on a substrate to be corrected, locally heating and evaporating the correction material, and by burrying the pin holes or pattern deficiency parts caused on the substrate.</p>
申请公布号 JPS5421276(A) 申请公布日期 1979.02.17
申请号 JP19770086863 申请日期 1977.07.19
申请人 MITSUBISHI ELECTRIC CORP 发明人 UNO JIYUN;YAMAZAKI TERUHIKO;HATSUHARA TOSHIHIKO
分类号 G03F1/00;G03F1/72;H01L21/027;H01L21/302 主分类号 G03F1/00
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