| 摘要 |
PURPOSE:To provide an exposing pattern having high-precision over an entire projecting face so that the pattern on the projecting face is not out of focus, by mounting a photoelectron generating film pattern on a concave portion of a curved surface mask. CONSTITUTION:An electron beam exposing apparatus which irradiates ultraviolet rays on a photoelectron generating film, focuses and projects photoelectrons radiated from the photoelectron generating film, and transfers the pattern of the photoelectron generating film to a material, is provided with a curved surface reticle 13 whose concave portion is provided with a pattern consisting of the photoelectron generating film. To form the curved surface reticle 13, for example, a platinum film 11 is coated on an entire face of a metal plate 10, and thereon a photoelectron generating film pattern consisting of a desired gold film 12 is formed. This photoelectron generating film pattern is made a precalculated pattern form, taking into consideration that it is to be curved at a predetermined curvature. Thereon a protecting film 20 such as organic material is coated to cover the platina film 11 and the gold film 12. Next, it is pressed between an upper die and a lower die of a press having a desired curvature to make a desired curved-surface. Lastly, the protecting film 20 is dissolved by a solvent. |
