发明名称 |
PATTERN GENERATING APPARATUS |
摘要 |
PATTERN GENERATING APPARATUS Integrated circuit mask patterns are laser machined by mounting substrates on a support that is periodically stepped in a y direction after each scan by a laser writing beam in an x direction. X-direction scanning is accomplished by mounting a mirror on a carriage that reciprocates by rebounding between two displaced coil springs. A coding laser beam is reflected from the carriage through a stationary code plate, comprising alternate transparent and opaque stripes, to monitor the position of the carriage and to control the modulation of the writing beam. |
申请公布号 |
CA1048661(A) |
申请公布日期 |
1979.02.13 |
申请号 |
CA19750232908 |
申请日期 |
1975.08.06 |
申请人 |
WESTERN ELECTRIC COMPANY, INCORPORATED |
发明人 |
FIRTION, VICTOR A.;RONGVED, LEIF;SAUNDERS, THOMAS E. |
分类号 |
H05K3/00;B23K26/08;B41C1/00;G02B27/00;G03F7/20;H01B3/00;H01L21/027 |
主分类号 |
H05K3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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