发明名称 PATTERN GENERATING APPARATUS
摘要 PATTERN GENERATING APPARATUS Integrated circuit mask patterns are laser machined by mounting substrates on a support that is periodically stepped in a y direction after each scan by a laser writing beam in an x direction. X-direction scanning is accomplished by mounting a mirror on a carriage that reciprocates by rebounding between two displaced coil springs. A coding laser beam is reflected from the carriage through a stationary code plate, comprising alternate transparent and opaque stripes, to monitor the position of the carriage and to control the modulation of the writing beam.
申请公布号 CA1048661(A) 申请公布日期 1979.02.13
申请号 CA19750232908 申请日期 1975.08.06
申请人 WESTERN ELECTRIC COMPANY, INCORPORATED 发明人 FIRTION, VICTOR A.;RONGVED, LEIF;SAUNDERS, THOMAS E.
分类号 H05K3/00;B23K26/08;B41C1/00;G02B27/00;G03F7/20;H01B3/00;H01L21/027 主分类号 H05K3/00
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