发明名称 Developing method for photosensitive material.
摘要 <p>This invention provides a developing method for photosensitive materials, in particular for a positive photosensitive lithographic printing plate, which enables an efficient development with minimum consumption of the developing liquid. The developing method of the present invention comprises the steps of: conducting a preparatory development by applying a developing liquid to an exposed photosensitive layer of a photosensitive material, the developing liquid being supplied in an amount of necessary for each developing cycle; removing the developing liquid; discarding the developing liquid; and again applying a developing liquid to the photosensitive material to complete the development.</p>
申请公布号 EP0206308(A1) 申请公布日期 1986.12.30
申请号 EP19860108559 申请日期 1986.06.23
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KOBAYASHI, KESANAO FUJI PHOTO FILM CO. LTD.;OHBA, HISAO FUJI PHOTO FILM CO. LTD.;TOYAMA, TADAO FUJI PHOTO FILM CO. LTD.
分类号 G03F7/30 主分类号 G03F7/30
代理机构 代理人
主权项
地址