| 摘要 |
<p>A method for electrolytic deposition of metals, particularly zinc, in which the tendency for the cathode to be attacked in the immediate vicinity of the solution level is eliminated or greatly reduced by positioning a barrier structure in the cell assembly in a manner such that it extends from slightly above to slightly below the level of the solution in the cell. The barrier, which may be of any material resistant to attack by the electrolytic solution, prevents the migration of the oxygen at the solution level and thus protects the cathode from solution level attack. </p> |
