发明名称 METHOD OF PRODUCING EPITAXIAL MEMBRANE
摘要 A high temperature method for the preparation of single and multiple epitaxial layers of single-phase lead sulfide-selenide, [Pb]a[SxSe1-x]1-a wherein x varies between one and zero, inclusive, and a=0.500+/-0.003, deposited upon substrates of barium fluoride, BaF2, maintained in near thermodynamic equilibrium with concurrently sublimated lead alloy and chalcogenide sources. During preparation, the substrate is exposed to the vapor emanating from the single chimney of a two-zone, dual-chamber furnace, thereby providing an epilayer of uniform, and predetermined electrical and optical properties.
申请公布号 JPS5416977(A) 申请公布日期 1979.02.07
申请号 JP19780063211 申请日期 1978.05.26
申请人 US GOVERNMENT 发明人 RICHIYAADO BII SUKUURAA
分类号 C30B23/02;C30B29/46;H01L21/203;H01L21/331;H01L21/365;H01L29/73;H01L31/10 主分类号 C30B23/02
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