PROCESSING METHOD FOR SURFACE OF SEMICONDUCTOR DEVICE,申请号JP19770079878-传众专利搜索

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发明名称	PROCESSING METHOD FOR SURFACE OF SEMICONDUCTOR DEVICE
摘要
申请公布号	JPS5414678(A)	申请公布日期	1979.02.03
申请号	JP19770079878	申请日期	1977.07.06
申请人	HITACHI LTD	发明人	NAGASAWA KOUICHI;ANSAI NORIO
分类号	H01L21/302;H01L21/3065	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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