| 摘要 |
PURPOSE:To prepare a pellicle film serving as protective and dust preventing film which is delaminated easily without troublesome processes nor without generating defects in the film by forming the pellicle film on a smooth base material having Cr or Cr alloy on the surface and stripping off the film thereafter. CONSTITUTION:A pellicle film is formed on a base material having Cr or Cr alloy at least on the surface, with a purpose for protection and dust prevention of surface of a base plate of a photomask or reticle to be used for the prepn. of a semiconductor IC, with a fixed distance from the surface of the base plate. The pellicle film is stripped off after it has been formed on a smooth base plate having Cr or Cr alloy on at least the surface of the base plate. Thus, the stripping is performed easily, and a pellicle film can be produced without generating defects such as elongation, wrinkles, scratches, or breakage etc., are all. |
