| 发明名称 |
MANUFACTURE OF PHOTTO MASK |
| 摘要 |
PURPOSE:To manufacture a highly-precise photo mask with the breakdown of a shielding film prevented, by providing a concave through etching after ion-injecting by using a protective film on the shielding film as a mask. |
| 申请公布号 |
JPS548978(A) |
申请公布日期 |
1979.01.23 |
| 申请号 |
JP19770075191 |
申请日期 |
1977.06.23 |
| 申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
ENOMOTO TATSUYA;ISHIKAWA YUUICHI |
| 分类号 |
G03F1/00;G03F1/60;G03F1/68;G03F1/80;H01L21/027;H01L21/302 |
主分类号 |
G03F1/00 |
| 代理机构 |
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| 地址 |
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