发明名称 DEVELOPMENT OF RESIST
摘要 PURPOSE:To prevent a net-shaped resist from being left even if the inter-line space is narrow by irradiating the resist composed of high molecules having an epoxy radical at its side chain with an electron beam or X ray and then by effecting development while using dioxane as a developing liquid.
申请公布号 JPS547930(A) 申请公布日期 1979.01.20
申请号 JP19770072887 申请日期 1977.06.21
申请人 FUJITSU LTD 发明人 KITAMURA TATEO;YONEDA YASUHIRO;KITAKOUJI TOSHISUKE
分类号 H05K3/06;G03F7/30;G03F7/32;H01L21/027;H01L21/30 主分类号 H05K3/06
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