| 发明名称 |
XXRAY MASK SUPPORT AND ITS MANUFACTURE |
| 摘要 |
<p>PURPOSE:To improve the productivity and reliability of a X-ray mask by obtaining a composite two-layer film in strain, by providing a frame-shaped Si3N4 film to the revarse surface of a Si substrate and by stacking and forming a Si3N4 film of less than 0.5mum in thickness and a SiC film of less than 5mum on its top surface.</p> |
| 申请公布号 |
JPS547275(A) |
申请公布日期 |
1979.01.19 |
| 申请号 |
JP19770072692 |
申请日期 |
1977.06.18 |
| 申请人 |
NIPPON TELEGRAPH & TELEPHONE |
发明人 |
YOSHIHARA HIDEO;KADOTA TOSHIKI;MORI HIDEFUMI |
| 分类号 |
H01L21/027;H01L21/302 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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