发明名称 METHOD OF STRUCTURING THIN LAYERS
摘要 <p>A method of structuring oxide layers, nitride layers or magnetic layers in such manner that a photolacquer mask is manufactured on a substrate and the layer to be structured is provided by means of cathode sputtering both on the photolacquer mask and on the surfaces of the substrate not covered with lacquer. The substrate is then treated with a solvent attacking the lacquar mask; the mask swells up and the parts of the layer to be structured present thereon are chipped off. In order to stimulate this latter process, a layer is provided below the photolacquer mask on the substrate relative to which photolacquer has a small adhesive capacity and, after providing the layer to be structured, an increase in volume of the lacquer mask is produced by thermal treatment. After the complete removal of the photolacquer mask and the parts of the layer to be structured present thereon, the structured thin layer remains on the substrate as a negative of the pattern of the photolacquer mask.</p>
申请公布号 CA1046648(A) 申请公布日期 1979.01.16
申请号 CA19750232152 申请日期 1975.07.24
申请人 N.V. PHILIPS'GLOEILAMPENFABRIEKEN 发明人 HUEBSCH, HUBERTUS;CONVERTINI, URSULA;DIMIGEN, HEINZ;LUETHJE, HOLGER
分类号 C23F1/00;G03F7/09;G03F7/11;G03F7/40;G03F7/42;H01L21/00;H01L21/28;H01L21/306;H01L23/29;H05K3/04;(IPC1-7):01L21/18 主分类号 C23F1/00
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