<p>A microwave plasma processing system has heating means for heating the wall of a reaction chamber, and an adhesion preventing member in which a cylinder disposed so as to be in contact with the inner face of a wall of the reaction chamber and a microwave reflecting plate having a gas discharge hole are integrally formed. A microwave plasma processing system has heating means for heating the wall of a reaction chamber, and a microwave reflecting plate which is attached to the inner face of a wall of the reaction chamber and which has a gas discharge hole. <IMAGE></p>
申请公布号
EP0688037(A1)
申请公布日期
1995.12.20
申请号
EP19950109089
申请日期
1995.06.13
申请人
SUMITOMO METAL INDUSTRIES, LTD.;NEC CORPORATION
发明人
KATAYAMA, KATSUO, C/O SUMITOMO METAL IND., LTD.;KOMACHI, KYOICHI, C/O SUMITOMO METAL IND., LTD.;MABUCHI, HIROSHI, C/O SUMITOMO METAL IND., LTD.;AKIMOTO, TAKESHI, C/O NEC CORPORATION