发明名称 METAL FILM PATTERNING METHOD
摘要 PURPOSE:To carry out patterning of good finish with good work efficiency by selectively forming a photoresist film on a wafer and forming a metal film on the whole surface after which a pressurized fluid is sprayed.
申请公布号 JPS542941(A) 申请公布日期 1979.01.10
申请号 JP19770068134 申请日期 1977.06.09
申请人 FUJITSU LTD 发明人 SHIRAI KAZUNARI
分类号 C23C14/04;H01L21/28 主分类号 C23C14/04
代理机构 代理人
主权项
地址