| 摘要 |
<p>A method for making a flat screen active matrix consisting of an array of electrodes forming a picture element or pixel connected to a cross grating of rows and columns via an underlying-gate transistor, the rows being connected to the transistor gates while the source and drain are connected to the column and the pixel electrode. The method is characterised in that a first step comprises etching contact patterns (m) at the same time as the level defining the gates, and in that the ITO layer (8) defining the pixel electrodes is deposited and etched in a final step. The method is useful for making an LCD active matrix.</p> |
