| 摘要 |
A method for producing a SiO2 glass material having regions changed in light refractive index is provided which comprises implanting at least 5x1019 Ge ions/cm3 into a SiO2 glass substrate, heat-treating the substrate at a temperature exceeding 300 DEG C., and exposing the substrate to an ultraviolet light. Also provided is a SiO2 glass material produced by the method. |
