| 摘要 |
<p>The process involves selective exposure of a water-soluble photopolymer material to reduce its solubility and development with aq. medium, followed by the application of a screen material to the pattern and uncoated areas and removal only of the pattern and its coating. The novely is that the pattern and surface are rinsed with an aq. soln. contg. borate ions after development of the pattern and before coating with the screen material. This intermediate treatment eliminates optical flaws. Pref. an aq. soln. of boric acid, borax, alkali perborate or B2O3 is used.</p> |
