| 发明名称 |
FORMING METHOD FOR THIN FILM PATTERN |
| 摘要 |
PURPOSE:To prevent the occurrence of a defect on the thin film pattern having a revesible pattern of the photoresist film in the lift-off process by previously haardening the surface of the photoresist film formed on the substrate. |
| 申请公布号 |
JPS53147531(A) |
申请公布日期 |
1978.12.22 |
| 申请号 |
JP19770062334 |
申请日期 |
1977.05.27 |
| 申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
TSUKAMOTO KATSUHIRO |
| 分类号 |
H01L21/027;G03F7/20;G03F7/26;H01L21/302;H01L21/3065 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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