发明名称 A mask for fabricating a semiconductor device and method thereof
摘要 A mask comprises a substrate 2 which is optically transparent with an opaque pattern 3 thereon; mask frames 14 placed on the upper and lower edges of the mask; a plurality of holes and screws 15,15a for removably fixing the mask frames round the mask; a pellicle frame 6 attached to top and bottom surfaces of each mask frame; and a pellicle 7 attached to top and bottom surfaces of each pellicle frame and thus covering a centre part of the mask. It is thus possible to replace the mask within the protective frame without scrapping the mask. The mask frames may be fixed by clamps and grooves (Figs 6-8 not shown) rather than screws and the mask may be a single opaque substrate with holes (Fig 5 not shown).
申请公布号 GB2332534(B) 申请公布日期 1999.11.03
申请号 GB19980024540 申请日期 1998.11.09
申请人 * LG SEMICON CO., LTD. 发明人 SEUNG-SEOK * YOO
分类号 G03F1/14;G03F1/64;G03F7/20;(IPC1-7):G03F1/14 主分类号 G03F1/14
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