Fine grid structure prodn. - using photolithographic process to expose photosensitive layer twice to form two crossing sets of wires

摘要

The prodn. method is for fine grid structures. The grid has two crossing sets of wires. A negative of the structure is produced photolithographically on a photosensitive layer on a support, and the structure is produced by deposition of metal. The photosensitive layer is exposed twice, producing a first set of wires (101) during first exposure, and the second set of wires (102) during a second exposure. The same mask can be used for both exposures. For the second exposure the mask is turned through an angle of 90 deg. The first photosensitive layer can be at lest partially developed after the first exposure.