| 发明名称 |
PROJECTIONNTYPE MASK ALIGNER |
| 摘要 |
PURPOSE:To secure a high-recision alignment between the photo mask and the wafer by synchronizing the optical axis of the detecting optical system with the extended line combining the center of the mask positioning pattern and the incident iris of the projection lens. |
| 申请公布号 |
JPS53144270(A) |
申请公布日期 |
1978.12.15 |
| 申请号 |
JP19770058686 |
申请日期 |
1977.05.23 |
| 申请人 |
HITACHI LTD |
发明人 |
AKIYAMA NOBUYUKI;KOIZUMI MITSUYOSHI;OOSHIMA YOSHIMASA |
| 分类号 |
H01L21/30;G03F1/54;H01L21/027;H01L21/67;H01L21/68 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 地址 |
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