| 发明名称 |
MANUFACTURE FOR LINE PATTERN OF VARIABLE PITCH PATTERN |
| 摘要 |
PURPOSE:To obtain the base line pattern excellent and having no unevenness surely and easily, by suitably altering the exposing line through moving shield body and by picking up the pattern with the specifications of a given pitch pattern, as a manufacturing method of line patterns. |
| 申请公布号 |
JPS53137663(A) |
申请公布日期 |
1978.12.01 |
| 申请号 |
JP19770052028 |
申请日期 |
1977.05.09 |
| 申请人 |
HITACHI LTD |
发明人 |
NAKAMURA TOMIZOU;TERAJIMA ETSUZOU |
| 分类号 |
H01J9/14;G03F1/00;H01J29/07 |
主分类号 |
H01J9/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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