THIN CONDUCTOR LINES MADE BY A MASK LIFT- OFF TECHNIQUE

摘要

A method of providing on a substrate surface a conductor pattern having portions which are present at a mutual distance smaller than 10 .mu. by directed deposition of the material for the conductor portions according to different directions via a mask which has apertures which are present comparatively closely beside each other and which mask is arranged at a small distance above the substrate surface. Said method is suitable in particular for use in the manufacture of semiconductor devices, for example, charge transfer devices.