| 摘要 |
<p>This invention relates to a process for the manufacture of compounds of the formula I wherein X represents an oxygen or sulphur atom, R1 represents a hydrogen atom or a lower alkyl group, R6' represents a halogen atom or a lower alkyl, lower alkoxy, lower alkylthio, lower alkylsulphonyl, di(lower alkyl)sulphamoyl, hydroxy, benzyloxy, trimethylsilyloxy, trifluoromethyl, nitro, amino or di(lower alkyl)amino group, R7' and R8' each individually represent a hydrogen atom or a substituent denoted by R6' and Y represents lower alkylsulfonyloxy, lower arylsulfonyloxy, chlorine or bromine, which comprises reacting a compound of the formula II wherein X, R1 and R6' - R8' have the above meanings, with a lower alkyl- or lower arylsubstituted sulfonic acid halide or thionyl chloride or bromide The dibenzo¢b,f!thiepin and dibenz¢b,f!oxepin derivatives of formula I are useful as starting materials for the manufacture of dibenzo¢b,f!thiepin and dibonz¢b,f!oxopin derivatives which form the subject matter of our copending Canadian Application for Letters Patent No 201,871 filed June 6, 1974.</p> |
