| 发明名称 |
CORRECTING METHOD FOR DEFECT OF PHOTOMASK |
| 摘要 |
PURPOSE:To correct defects by irradiating electron beam to the photomask light transmission part in the atmosphere where organic compound vapour exists. |
| 申请公布号 |
JPS53135276(A) |
申请公布日期 |
1978.11.25 |
| 申请号 |
JP19770050423 |
申请日期 |
1977.04.30 |
| 申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
NISHIOKA SUNAO |
| 分类号 |
H01L21/30;G03F1/00;G03F1/72;G03F1/74;H01L21/027 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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