| 发明名称 |
PHOTOMASK FOR PHOTOMECHANICS |
| 摘要 |
PURPOSE:To enhance a production efficiency by giving the best arrangement type of element chip groups to the arrangement shape of photomask chip groups for photomechanical process. |
| 申请公布号 |
JPS53135278(A) |
申请公布日期 |
1978.11.25 |
| 申请号 |
JP19770050430 |
申请日期 |
1977.04.30 |
| 申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
SAISHIYUU SUNAO;YAMAZAKI TERUHIKO |
| 分类号 |
H01L21/027;G03F1/00;G03F1/70;H01L21/302 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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