| 摘要 |
<p>Dry cleaning equipment and a method are provided to remove the organic and the inorganic contaminants located on a surface of workpiece without generating the environmental pollution. A dry cleaning apparatus comprises a flash cleaning unit(100), a laser cleaning unit(200), a scanning unit(300), a dust removing unit(400), a integration control unit(500) and a cooling unit(600). The flash cleaning unit has the flash generating unit for generating the pulse wave flash. The flash cleaning unit can remove the organic contamination material located on the surface of the workpiece(W) using the pulse wave flash. The laser cleaning unit has the laser generator for generating the laser organic shock wave. The laser cleaning unit can remove the inorganic contaminant located on the surface of workpiece by using the laser organic impulse wave. The scanning unit has the worktable for supporting the workpiece. The scanning unit can perform the front side scanning by moving the worktable. The dust removing unit can remove the contaminants separated from the surface of workpiece. The integration control unit generally can control the laser cleaning unit, the flash cleaning unit and the scanning unit. The cooling unit supplies the cooling water to the laser generator of the laser cleaning unit or the flash generating unit of the flash cleaning unit.</p> |
