IMPRINT PROCESSING SYSTEM AND PATTERN FORMING METHOD

摘要

An imprint processing system and a pattern forming method are provided to secure a route on which ultraviolet ray is irradiated by simplifying a process space. An imprint processing system includes a bonding processing chamber(110), a lithography processing chamber(120), and an isolation processing chamber(130). The bonding processing chamber bonds a stamp having a pattern and a substrate on which a photosensitive film is coated. The lithography processing chamber hardens the photosensitive film by irradiating ultraviolet ray on the stamp and the substrate. The isolation processing chamber isolates the bonded stamp and the substrate.