PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD

摘要

A pattern forming device capable of controlling distance between stamp and substrate, and a pattern forming method are provided to prevent damage of a stamp or damage of a pattern by preventing quality degradation due to a bubble in forming the pattern. A pattern forming device comprises a first chamber(100), a second chamber(110), and a pressurization control part(130). The first chamber has a stamp. The second chamber is coupled with the first chamber in order to form a process space, and supports a substrate having a pattern formed by the stamp. The pressurization control part attaches the stamp on the substrate.