| 摘要 |
<p>A clean in place gassing manifold comprises a gassing module comprising a hub, the gassing module and the hub being formed as a unitary device; and a complimentary clean in place module for coupling the gassing module, the complimentary clean in place module comprising a head that inserts into the hub of the gassing module. The gassing module coupled with the complimentary clean in place module allow a cleaning solution to be pumped through the coupled modules at and above a minimum flow rate and a minimum velocity for effective cleaning.</p> |
