发明名称 SEMICONDUCTOR SUPERLATTICE STRUCTURE
摘要 <p>A semiconductor structure may be fabricated that confines current flow to two dimensions by constructing as a structure a body of alternate regions of different semiconductor materials with current flow parallel to the intersections of the regions. The structure, in device form, exhibits the properties of selectable energy gap, higher carrier mobility and increased electronic density of states. Such devices are usable for their bulk properties, their junction electro-optical properties and their junction transistor properties.</p>
申请公布号 JPS53131779(A) 申请公布日期 1978.11.16
申请号 JP19770148251 申请日期 1977.12.12
申请人 IBM 发明人 RAROI RIGON CHIYAN;REO ESAKI
分类号 H01L33/00;H01L21/331;H01L29/15;H01L29/73;H01L47/02 主分类号 H01L33/00
代理机构 代理人
主权项
地址